Identification | More | [Name]
HEXACHLORODISILANE | [CAS]
13465-77-5 | [Synonyms]
HEXACHLORODISILANE 1,1,1,2,2,2-Hexachlorodisilane Disilane, hexachloro- hexachloro-disilan Si2Cl6 Disilicon hexachloride | [EINECS(EC#)]
236-704-1 | [Molecular Formula]
Cl6Si2 | [MDL Number]
MFCD00011599 | [Molecular Weight]
268.89 | [MOL File]
13465-77-5.mol |
Chemical Properties | Back Directory | [Appearance]
colourless liquid | [Melting point ]
<0°C | [Boiling point ]
144-145.5 °C (lit.) | [density ]
1.562 g/mL at 25 °C(lit.)
| [vapor pressure ]
2.8hPa at 25℃ | [refractive index ]
n20/D 1.475(lit.)
| [Fp ]
78°C | [storage temp. ]
below 5° C | [solubility ]
sol CHCl3, CH2Cl2, benzene, THF; reacts violently,
producing toxic fumes, with H2O, alcohols. | [form ]
liquid | [color ]
Colorless to Almost colorless | [Specific Gravity]
1.562 | [Stability:]
Stable, but reacts violently with water. Moisture sensitive. May be shock sensitive. Incompatible with water, moisture, acids, strong bases, oxidizing agents, alcohols. | [Hydrolytic Sensitivity]
8: reacts rapidly with moisture, water, protic solvents | [CAS DataBase Reference]
13465-77-5(CAS DataBase Reference) | [EPA Substance Registry System]
Disilane, hexachloro- (13465-77-5) |
Safety Data | Back Directory | [Hazard Codes ]
C | [Risk Statements ]
R14:Reacts violently with water. R34:Causes burns. | [Safety Statements ]
S26:In case of contact with eyes, rinse immediately with plenty of water and seek medical advice . S36/37/39:Wear suitable protective clothing, gloves and eye/face protection . S45:In case of accident or if you feel unwell, seek medical advice immediately (show label where possible) . | [RIDADR ]
UN 2987 8/PG 2
| [WGK Germany ]
3
| [F ]
3-10-21 | [TSCA ]
Yes | [HazardClass ]
8 | [PackingGroup ]
II | [HS Code ]
28121049 |
Hazard Information | Back Directory | [Chemical Properties]
colourless liquid | [Physical properties]
bp 144–145.5 °C; d 1.562 g cm?3. | [Uses]
Hexachlorodisilane can be used in deoxygenation and desulfurization of phosphine oxides, phosphine
sulfides, and amine oxides; reducing agent for nitro groups
and sulfur diimides. | [Preparation]
Hexachlorodisilane is prepared in the chlorination of silicides such as e.g. calcium silicide. Idealized syntheses are as follows:
CaSi2 + 4 Cl2 → Si2Cl6 + CaCl2
| [Reactions]
Hexachlorodisilane is a versatile chemical reagent that can be used in the following chemical reactions[1-2]: (1) When hexachlorodisilane is heated with a catalytic amount of triphenylphosphine or triphenylarsine, it decomposes according to the equation nSi2Cl6 = nSiCl4 + (SiCl2)n. It does not react with trifluoromethylphosphine. Hexabromodisilane is also decomposed by trimethylamine. (2) Hexachlorodisilane reacts with hydrogen chloride in the presence of pyridine, and the reaction formula is: Si2Cl6 + 2HCl = 2SiCl4 + H2. (3) Excess hydrogen bromide and hexachlorodisilane produce a mixture of hydrogen chloride and hydrogen bromide. (4) Hexachlorodisilane reacts with methyl chloride in the presence of triphenylphosphine to produce a mixture of methyltrichlorosilane and silicon tetrachloride. When hexachlorodisilane and methyl bromide are heated together in the presence of triphenylphosphine, a mixture of methyl chloride and bromine is produced. (5) Hexachlorodisiloxane reacts with sulfur trioxide to produce silicon dioxide, sulfur dioxide and hexachlorodisiloxane. | [General Description]
Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films. | [Flammability and Explosibility]
Nonflammable | [Toxics Screening Level]
The ITSL for hexachlorodisilane has been changed from 0.04 μg/m3 to 0.1 μg/m3 based on annual averaging time. | [References]
[1] H.J. EMELéUS; Muhammad T. Reaction of hexachlorodisilane with bases and alkyl halides[J]. Journal of Inorganic and Nuclear Chemistry, 1967. DOI:10.1016/0022-1902(67)80468-8. [2] B. S. SURESH D. P. Preparation of Hexafluorodisilane and Reactions of Hexafluorodisilane and Hexachlorodisilane with Sulfur Trioxide[J]. ACS Applied Electronic Materials, 1985. DOI:10.1246/BCSJ.58.1867.
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