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ChemicalBook--->CAS DataBase List--->19456-48-5

19456-48-5

19456-48-5 Structure

19456-48-5 Structure
IdentificationBack Directory
[Name]

POLY(9 9-DI-N-OCTYLFLUORENYL-2 7-DIYL)
[CAS]

19456-48-5
[Synonyms]

Poly(9,9-dioctylfluorene)
Poly(9,9-dioctylfluorenyl-2,7-diyl)
[Molecular Formula]

(C29H41)n
[MDL Number]

MFCD06202201
Chemical PropertiesBack Directory
[solubility ]

chloroform: soluble
Hazard InformationBack Directory
[Application]

At typical concentrations of 10 mg/ml, 100 mg of F8 (PFO) will make around 200 devices on Ossila''s standard ITO substrates (20 x 15 mm), assuming 50% solution usage (50% loss in filtering and preparation).

[Description]

Poly(9,9-di-n-octylfluorenyl-2,7-diyl), known as F8 or PFO, is a polyfluorene specifically optimised for a variety of organic electronic applications.
Safety DataBack Directory
[WGK Germany ]

3
Questions And AnswerBack Directory
[Classification]

Polyfluorenes, Benzothiodiazoles, Organic semiconducting materials, Semiconducting polymers, OLED green emitter materials, OLED materials, Organic Photovoltaic materials, Polymer solar Cells, OFET materials.
[Applications]

For a high-efficiency green OLED we recommend blending F8 with F8BT with the below specifications. This ink can then be applied either in air, or in a glovebox, with little difference in performance (provided exposure time and light levels are minimised).
At typical concentrations of 10 mg/ml, 100 mg of F8 (PFO) will make around 200 devices on Ossila's standard ITO substrates (20 x 15 mm), assuming 50% solution usage (50% loss in filtering and preparation).
OLED reference device:
  • F8 with F8BT
  • Blend ratio of 19:1 (F8:F8BT) in Toluene
  • Total concentration of 10 mg/ml
  • 0.45 μm PTFE filter
  • Spun at 2000 rpm (approx. 70 nm thickness)
Pipetting 20 μl of the above solutions onto a substrate spinning at 2000 rpm should provide a good even coverage, with approximately 70 nm thickness. The substrate needs to be spun until dry, which is typically only a few seconds — 15 seconds should be ample to achieve this. Thermal annealing should be undertaken at 80°C for 10 minutes prior to cathode deposition.
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